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Effects of annealing and temperature on acoustic dissipation in a micromechanical silicon oscillator

by: Hans Haucke, Xiao Liu, JF Vignola, BH Houston, MH Marcus, JW Baldwin
Applied Physics Letters, Vol. 86, No. 18. (2005)


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The temperature dependence (15–320  K) of the acoustic dissipation was studied for some lower vibrational modes of a suspended silicon plate 1.5  µm thick. Our oscillator was exposed to the laboratory environment prior to measurement, laser annealed while in a cryogenic vacuum, and remeasured. We find a dissipation peak at 160  K, similar to results by others, and a second dissipation peak near 30  K. Annealing reduced the dissipation at 160  K by as much as a factor of 10, and gave quality factors as high as 1.4×106 at 470  kHz and our lowest temperature. Our data support the idea that the 160  K peak is related to adsorbates, and show this mechanism is important at room temperature. Post-anneal room-temperature dissipation appears to be limited by thermoelastic loss for certain modes.


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