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Tag hbr-o2 [2 articles]

Recent papers classified by the tag hbr-o2.
  • notes Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma
    Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, No. 4. (2004), pp. 1552-1558.
    by Jinghao Chen, Won J Yoo, Zerlinda YL Tan, Yingqian Wang, Daniel SH Chan
    posted to xps high-k hfsio hfon hfo2 hfalo hbr-o2 fluorine cl2-o2 by these_morel on 2006-02-17 15:12:43 as read
  • notes Mass spectrometry studies of resist trimming processes in HBr/O[sub 2] and Cl[sub 2]/O[sub 2] chemistries
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 23, No. 1. (2005), pp. 103-112.
    by E Pargon, O Joubert, T Chevolleau, G Cunge, Songlin Xu, Thorsten Lill
    posted to cl2-o2 hbr-o2 icp mass-spectrometry resist-trimming by these_morel on 2006-03-21 11:34:47 as read
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