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Tag c4f8 [2 articles]

Recent papers classified by the tag c4f8.
  • notes 30 nm Tungsten gates etched by a low damage ICP etching for the fabrication of compound semiconductor transistors
    Microelectronic Engineering, Vol. 83, No. 4-9. ( 2006), pp. 1152-1154.
    by X Li, X Cao, H Zhou, CDW Wilkinson, S Thoms, D Macintyre, M Holland, IG Thayne
    posted to c4f8 etching icp sf6 tungsten by these_morel on 2006-07-26 12:51:56 as read along with 1 person Stanley_vrc
  • Behaviors of electron and negative-ion densities in low-pressure high-density inductively coupled plasmas of SF6, NF3, CF4, and C4F8 gases diluted with Ar
    Thin Solid Films, Vol. 407, No. 1-2. (22 March 2002), pp. 198-203.
    by Akihiro Kono, Masahito Konishi, Kenji Kato
    posted to c4f8 cf4 negative-ion nf3 plasmas sf6 by these_morel on 2006-12-13 15:49:29 as read
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